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- New Large Area EDS Detector for Transmission Electron Microscopy
- Bruker receives Honorable Mention for Seattle Business magazine’s 2011 Washington Manufacturing Award
- Bruker Announces the e-Flash HR – a New High-Resolution EBSD Detector
- Bruker AXS in Karlsruhe has new phone numbers
- Prof. David C. Joy wins 2010 Duncumb Award for Excellence in Microanalysis
Upcoming Events
- The Benefits of TXRF for Education and University Research
Mar 07, Webinar - Pittcon 2012
Mar 11-15, Orlando, Florida, USA - SEMICON China 2012
Mar 20-22, Shanghai, China - ARAB LAB 2012
Mar 26-29, Dubai, UAE - 2012 NUANCE-Bruker International Symposium
Apr 05, Evanston, IL, USA - ANALYTICA 2012
Apr 17-20, Munich, Germany
- The XFlash® 5010 Detector
XFlash® 5010 Detector
The core piece of this latest generation X-ray detector is a silicon chip that functions according to the drift chamber principle.
Due to the special chip design with integrated charge amplifier the XFlash® can process very high count rates and at the same time displays an excellent energy resolution, unrivaled by any other silicon-based energy dispersive X-ray detector. This allows you to perform tasks in minutes that used to take hours.
In summary, the XFlash® 5010 offers the following advantages over conventional thermoelectrically or liquid nitrogen cooled detectors
- excellent energy resolution (version with 123 eV at MnKα at 100,000 cps available)
- extremely high pulse load capacity,
- excellent light element performance (version with Be detection capability available),
- no elaborate, vibration-generating cooling systems,
- immediately available after power on,
- low operating cost,
- maintenance-free operation,
- small dimensions,
- low weight,
- affordable pricing.
Suggested areas of application for the XFlash® 5010 are
- EDS systems for SEMs,
- fast mapping systems for SEMs and
- high-resolution XRF systems.
