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- OrthoTec 2012
Jun 06-07, Winona Lake, IN, USA - ACHEMA 2012
Jun 18-22, Frankfurt/M., Germany - Seeing at the Nanoscale 2012
Jul 09-11, Bristol, UK - ACA Annual Meeting
Jul 28-Aug 01, Boston, Massachusettes, USA - ACS Fall
Aug 19-21, Philadelphia, Pennsylvania, USA
Low Temperature Devices
- Low Temperature Device
The advantages of collecting single crystal X-ray diffraction data at low temperatures have long been recognized by the scientific community. With the availability of efficient and reliable devices and publications reporting the use of low temperature have massively increased over the recent years. The technique offers a number of advantages:
- Higher diffraction resolution limit
- Investigation of phase transitions
- Reduced evaporation of solvent molecules
- Air and moisture sensitive samples locked in an inert matrix
- Obsolescence of capillaries
- Minimization of X-ray damage
Typically, a temperature range from 300 K to 80 K is sufficient and covers a wide range of low temperature experiments.
Temperatures of less than 80 K can be achieved using Helium-based low temperature systems, such as the
- n-Helix
