An Overview of XRF Basics

← Prev

Index

A

absorption
absorption edge
Angström (Å)
anode
anode material
atomic number
atomic shell
Auger effect

B

back-scattering electrons
binding energy
Bohr's atomic model
Bragg's equation
Bremsspektrum

C

cathode
characteristic radiation
of the elements in the sample material
collimator masks
Collimators
Compton scattering
counter plateau
crystal changer
crystal types
cup aperture
curved crystals

D

dead time correction
detectors
diffraction
discriminator
Dispersion

E

electromagnetic radiation
electron shells
electronic pulse processing
end-window tube, (see also)
energy levels
energy shells
exit window

F

flow counter
fluorescence yield

G

gamma radiation
generator, (see also)

H

high voltage

I

intensity
interference

K

Kcps
kiloelectronvolts keV

L

layer thickness
LiF(200), LiF(220), LiF(420)
line separation
line-shift correction

M

main amplifier
mass attenuation coefficient
multichannel spectrometer scanner
multichannel spectrometer MRS
multilayer XS-55, XS-N, XS-C, XS-B
multilayers

N

Nomenclature

O

output

P

photon
primary beam filter
proportional counter, sealed
pulse height analysis (PHA)
pulse height distribution
pulse height spectrum

Q

quanta

R

radiation intensity
Rayleigh scattering
reflection of higher orders

S

Sample cups
saturation thickness
scintillation counter
Secondary enhancement
sequential spectrometers
side-window tube
sine amplifier
Soller slit
Sources of standard samples
special crystals
ADP
Ge
InSb
LiF(420)
TIAP
XS-B
XS-C
XS-N
standard samples sources
standard types
sub-levels
Supplementary literature

T

tube current
Tube types
Tube-spectrum scattering at the sample material

V

vacuum seal

W

wavelengths

X

X-ray fluorescence spectrometer instrumentation
X-ray generator
X-ray quanta
X-ray tube

← Prev

Copyright © 2006, Bruker AXS, Inc. All Rights Reserved. — Web implementation by MacCetera LLC