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- Bruker Hosts 10th Annual International Nanoscience Conference
- Bruker Introduces Novel TERS-Ready AFM System
- Bruker Completes Acquisition of Center for Tribology, Inc.
- Bruker Announces Agreement to Acquire CETR
- Bruker Introduces Dimension Edge PSS Atomic Force Microscope for Advanced HB-LED Production Metrology
Upcoming Events
- OrthoTec 2012
Jun 06-07, Winona Lake, IN, USA - ACHEMA 2012
Jun 18-22, Frankfurt/M., Germany - Seeing at the Nanoscale 2012
Jul 09-11, Bristol, UK - ACA Annual Meeting
Jul 28-Aug 01, Boston, Massachusettes, USA - ACS Fall
Aug 19-21, Philadelphia, Pennsylvania, USA
Dimension™ X Automated Atomic Force Profiler
- Dimension X Automated AFM
Automated Atomic Force Microscope Cuts Etch Measurement Turnaround Time
Dimension™ X automated atomic force microscope replaces costly, destructive cross-sectioning techniques, cutting etch measurement time from days to minutes, to help you increase yield without sacrificing quality.
The Dimension X is engineered to provide unequaled throughput of 25 WPH (five sites) and provides in-line repeatable metrology for the most difficult to measure etch features.
Features
- Delivers fast, highly repeatable characterization and control of STI etch
- Unique Deep Trench (DT) mode enables nondestructive in-line measurement of features as small as 45nm
- Proven 300mm automation platform adopted by fabs worldwide
- Performs nondestructive measurement directly on production wafers
- Supports NIST-traceable calibration and proven correlation to SEM techniques
