X-ray Metrology

D8 FABLINE RMF

Thickness and composition of solder bumps can be analyzed with µ-XRF
Thickness and composition of solder bumps can be analyzed with µ-XRF

The system includes the vertical D8 goniometer with a UMC 300 stage for a horizontal sample position. It is fully SEMI S2 and S8 compliant and has a SECS/GEM interface for fab integration. It has a stress-free vacuum wafer chuck and it comes with an EFEM including a fan filter unit (FFU), handling robot, pre-aligner and one load port. The modularity of the tool allows optimisation according to the client’s needs.

The D8 FABLINE RMF offers you the best for thin film analysis with the combined strength of X-ray reflectivity (XRR) and micro X-ray fluorescence (µ-XRF). With a spot size down to 50 µm by 50 µm and automated pattern recognition, this tool is especially dedicated to the analysis and monitoring of product wafers, especially the Cu process, barrier and seed layers and metal interconnects.