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- Bruker Expands its Small Angle X-ray Scattering (SAXS) Product Portfolio
- Bruker Acquires Hecus MICROcaliX(R) Product Line to Expand Product Portfolio for Small Angle X-ray Scattering (SAXS)
- Bruker receives Honorable Mention for Seattle Business magazine’s 2011 Washington Manufacturing Award
- Bruker Announces $10M in New Orders for Novel Metrology Tools from Leading Semiconductor Manufacturer
- Bruker AXS in Karlsruhe has new phone numbers
Upcoming Events
- OrthoTec 2012
Jun 06-07, Winona Lake, IN, USA - ACHEMA 2012
Jun 18-22, Frankfurt/M., Germany - Seeing at the Nanoscale 2012
Jul 09-11, Bristol, UK - ACA Annual Meeting
Jul 28-Aug 01, Boston, Massachusettes, USA - ACS Fall
Aug 19-21, Philadelphia, Pennsylvania, USA
D8 FABLINE R
- 49 points XXR map on HfO2 thin film on a 300 mm silicon wafer
The system includes the vertical D8 goniometer with a UMC 300 stage for a horizontal sample position. It is fully SEMI S2 and S8 compliant and has a SECS/GEM interface for fab integration. It has a stress-free vacuum wafer chuck and it comes with an EFEM including a fan filter unit (FFU), handling robot, pre-aligner and one load port. The modularity of the tool allows optimization according to your needs.
The D8 FABLINE R is the top-class solution if you are looking for fast and precise X-ray reflectivity (XRR) analysis on blanket wafers. It is dedicated to the analysis of layer thickness, layer density and surface or interface roughness of ultra-thin gate oxides, high-k and low-k thin films, silicide and polycide films and barrier and metal layers.
