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CETR-PMT-4 Post Chemical Mechanical Polishing Cleaning Brush Tester

The World's Only Tester Capable of Testing & Developing Post CMP Cleaning Brushes

Bruker's CETR-PMT-4 post chemical mechanical polishing (CMP) brush tester can accommodate both cylindrical and disk brushes on the lower drive. The upper drive can hold disks and wafers of 2-, 3-, or 4-inch diameter. The brush can be rotated at a high RPM (0 - 500RPM). The ultra accurate sensors performs simultaneous measurements of the normal load, friction, and coefficient of friction with very high resolution and repeatability.

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Simultaneous Realtime Processing Of Microtribological Information

• Normal loads and friction forces via proprietary sensors, in both wafer pad and conditioner pad interfaces
• Contact acoustic noise (elastic waves) via proprietary sensors and amplifiers in both wafer pad and conditioner pad interfaces
• Use acoustic waves to characterize defectivity, scratches, and delamination formed during processing
• Measurements of the temperature of the incoming slurry, pad surface, and outgoing process waste

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Tribology & Mechanical Tester Analysis Software

Tribology & Mechanical Tester Analysis Software — Perform fast data acquisitioning and detailed data analysis with this flexible, Windows-based, software package standard to all Bruker test instruments