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- Bruker Hosts 10th Annual International Nanoscience Conference
- Bruker Introduces Novel TERS-Ready AFM System
- Bruker Completes Acquisition of Center for Tribology, Inc.
- Bruker Announces Agreement to Acquire CETR
- Bruker Introduces Dimension Edge PSS Atomic Force Microscope for Advanced HB-LED Production Metrology
Upcoming Events
- The Benefits of TXRF for Education and University Research
Mar 07, Webinar - Pittcon 2012
Mar 11-15, Orlando, Florida, USA - SEMICON China 2012
Mar 20-22, Shanghai, China - ARAB LAB 2012
Mar 26-29, Dubai, UAE - 2012 NUANCE-Bruker International Symposium
Apr 05, Evanston, IL, USA - ANALYTICA 2012
Apr 17-20, Munich, Germany
Nanolithography - Nanomanipulation
- SSRM image of a pattern on Si made by pulse voltage lithography, 8 x 8 µm2
The control software enables the design and writing of patterns on surfaces. Two options are available:
In the voltage induced lithography mode voltage pulses (+/-45V) are applied to the tip. Resulting electrochemical processes cause surface deposition.
In force lithography a defined force is applied to the tip on the surface to carve structures into the surface with nanometer precision.
Voltage induced lithography is a surface modification tool for basic research. The force lithography mode can be used on all soft but stable surfaces.
